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KV-300
KV-300
Tabletop film thickness tool with vision for measuring transparent films of thickness up to 500 µm. Si-71
Si-71
Tabletop metrology tool for measuring Si, GaAs, resist, ... of thickness range 20 µm to 500+ µm (Si) or > 1 mm of resist.  Ideal for process control of backthinned Si.
 

KF-10
Tabletop film thickness tool for measuring transparent films of thickness up to 160 µm.
 
L-2
L-2
Manual tabletop film thickness tool for measuring transparent films of thickness up to 160 µm. N-2
N-2
Replacement optics, PC, and software for Nanometrics microscope systems (180/181/210)
 
Inline L-2 product is also available in component form to allow easy integration or clustering with other tools. Very compact design enables in-process metrology.
 
  © Foothill Instruments film thickness, metrology, wafer thinning, backgrind